New particle-inspection system for CMP-planarization-processed metal layers

Masami Ikota; Aritoshi Sugimoto; Yuko Inoue; Junichi Taguchi; Tetsuya Watanabe

doi:10.1117/12.308742

8 June 1998 New particle-inspection system for CMP-planarization-processed metal layers

Masami Ikota, Aritoshi Sugimoto, Yuko Inoue, Junichi Taguchi, Tetsuya Watanabe

Proceedings Volume 3332, Metrology, Inspection, and Process Control for Microlithography XII; (1998) https://doi.org/10.1117/12.308742
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

With the application of chemical mechanical polishing (CMP), particles become the main defect mode among the various modes of defects. Therefore, particle control becomes increasingly important. For the effective particle control, we need to control not only the number of defects but also the size of defects. However, a conventional particle inspection system using laser scattering could not obtain the information of the accurate particle size. We have developed the new system which can obtain the information of accurate particle size by using image processing. The particle size measured by the new system well agrees with the size measured by SEM. With the new system, we can operate the killer particle control effectively.

Citation Download Citation

Masami Ikota, Aritoshi Sugimoto, Yuko Inoue, Junichi Taguchi, and Tetsuya Watanabe "New particle-inspection system for CMP-planarization-processed metal layers", Proc. SPIE 3332, Metrology, Inspection, and Process Control for Microlithography XII, (8 June 1998); https://doi.org/10.1117/12.308742

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