Photoresist performance evaluation of implant resist systems

David C. Pritchard; Warren Montgomery; James P. Kimball; Jeff A. Albelo

doi:10.1117/12.312367

29 June 1998 Photoresist performance evaluation of implant resist systems

David C. Pritchard, Warren Montgomery, James P. Kimball, Jeff A. Albelo

Proceedings Volume 3333, Advances in Resist Technology and Processing XV; (1998) https://doi.org/10.1117/12.312367
Event: 23rd Annual International Symposium on Microlithography, 1998, Santa Clara, CA, United States

Abstract

Semiconductor manufacturers continue to look for better techniques to create salable devices. As with any other manufacturing entity, cost effectiveness without sacrificing quality is the key. In photolithographic manufacturing, the elements that drive the cost are raw materials, process time (throughput), and process complexity (number and iterations of process phases). The specific area being addressed by this paper is the implant layers of the semiconductor fabrication process.

Citation Download Citation

David C. Pritchard, Warren Montgomery, James P. Kimball, and Jeff A. Albelo "Photoresist performance evaluation of implant resist systems", Proc. SPIE 3333, Advances in Resist Technology and Processing XV, (29 June 1998); https://doi.org/10.1117/12.312367

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