HECTOR: transnanometer Z-axis calibration artifacts for semiconductor process control

Alson E. Hatheway

doi:10.1117/12.324354

3 September 1998 HECTOR: transnanometer Z-axis calibration artifacts for semiconductor process control

Alson E. Hatheway

Proceedings Volume 3507, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV; (1998) https://doi.org/10.1117/12.324354
Event: Microelectronic Manufacturing, 1998, Santa Clara, CA, United States

Abstract

An electromagnetic Lorenz force transducer has been coupled to an Angstrom elastic transducer to form a new compound transducer in which the displacement output is proportional to the current input. It is called the HECTOR transducer and has been built in a form which provides very small displacements in response to modest currents. The transduction effect is shown to be linear and hysteresis- free which provides for accurate calibration of the transducer and highly repeatable performance. The HECTOR transducer can generate reliable and repeatable small displacements in the trans-nanometer region: that is the region characterized by dimensional sizes between about 100nm and smaller than an angstrom. HECTOR's displacements may be used as physical artifacts in the calibration of metrology instruments. This paper describes HECTOR's operating principles and calibration techniques and discuss the accuracy and stability of the artifacts that HECTOR can generate.

Citation Download Citation

Alson E. Hatheway "HECTOR: transnanometer Z-axis calibration artifacts for semiconductor process control", Proc. SPIE 3507, Process, Equipment, and Materials Control in Integrated Circuit Manufacturing IV, (3 September 1998); https://doi.org/10.1117/12.324354

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