Comparison of CD variation between organic and inorganic bottom antireflective coating on topographic substrates

Satoko Nakaoka; Hisashi Watanabe; Yoshimitsu Okuda

doi:10.1117/12.354411

26 July 1999 Comparison of CD variation between organic and inorganic bottom antireflective coating on topographic substrates

Satoko Nakaoka, Hisashi Watanabe, Yoshimitsu Okuda

Author Affiliations +

Proceedings Volume 3679, Optical Microlithography XII; (1999) https://doi.org/10.1117/12.354411
Event: Microlithography '99, 1999, Santa Clara, CA, United States

Abstract

This paper describes the CD control of using bottom anti- reflective coating (BARC) processes on topographic substrates for DUV lithography. The CD variation using organic anti-reflective coating (ARC) and inorganic anti- reflective layer (ARL) is different because of their coverage characteristics on topography. We have compared the CD variation of different BARC processes on various step widths and heights. The CD range using highly planarizing ARC was smaller than that using another less planarizing local step is advantageous to CD control on topographic substrates. We analyzed the cause of large CD variation using ARL and found that the impact of the oblique reflection from a photoresist/ARL interface at steps.

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Satoko Nakaoka, Hisashi Watanabe, and Yoshimitsu Okuda "Comparison of CD variation between organic and inorganic bottom antireflective coating on topographic substrates", Proc. SPIE 3679, Optical Microlithography XII, (26 July 1999); https://doi.org/10.1117/12.354411

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