Paper
8 April 1999 Magnetron sputter epitaxy of n+-InSb on p-InSb for infrared photodiode applications
Waldemar Gawron, Krzysztof Adamiec, Waldemar Larkowski
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Abstract
Narrow gap intrinsic semiconductors, extrinsic semiconductors and low dimensional structures have been used for infrared applications. Here we propose indium antimonide for infrared photodetectors operating in the 3 - 5 micrometers wavelength range at 80 K. These high performance single or multi-element detectors are typically fabricated from bulk InSb, using processes in involving the diffusion of dopants to product the p+-n homojunctions. We present a new growth technique, RF magnetron sputter epitaxy, where indium and antimony are supplied from solid n-InSb sputter target. Using this technique we have deposited n+-type epilayers on p-type bulk InSb A 1 - 2 micrometers n+ InSb layer grown on p InSb at a growth temperature of 350 - 370 degree(s)C. The layers show excellent surface morphology and crystallinity. We have used these epilayers to fabricate homojunction infrared photodiodes. The spectral and I-V characteristics of this diode have been presented and compared with the more widely reported metallurgical diffused junctions. This is the first material quality obtained for InSb nucleated directly onto InSb by rf magnetron sputter epitaxy simultaneously formatting np junction reported to date.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Waldemar Gawron, Krzysztof Adamiec, and Waldemar Larkowski "Magnetron sputter epitaxy of n+-InSb on p-InSb for infrared photodiode applications", Proc. SPIE 3725, International Conference on Solid State Crystals '98: Epilayers and Heterostructures in Optoelectronics and Semiconductor Technology, (8 April 1999); https://doi.org/10.1117/12.344749
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KEYWORDS
Photodiodes

Epitaxy

Infrared radiation

Infrared photography

Diodes

Indium

Photodetectors

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