Paper
27 August 1999 Aberration theory and a design method of double-element optical systems
Shin Masui, Takeshi Namioka
Author Affiliations +
Abstract
To establish the theoretical basis for providing a better design method of synchrotron radiation beamline optics, we have developed a third-order aberration theory of a double- grating system and derived analytic formulas for spot diagrams and aberration curves. We describe an analytic merit function and a new definition of the resolving power. The former closely represents the variance of a very large number of ray-traced spots in the image plane and takes into account the dimensions of a source and optical elements. The latter takes into account the effects of an asymmetric line profile and a finite exit-slit width. The equations of aberration curves, merit function, and the definition of the resolving power are evaluated by taking three designs of a Monk-Gillieson varied-spacing plane grating monochromator as testing optics. The analytic merit function is used for these designs. The result show that the features of ray- traced spot diagrams can be analyzed by means of aberration curves and that realistic resolving power can be predicted by the new definition. The results also show the relation between the formation of coma-free images and the choice of design wavelengths. All these findings support the effectiveness of the analytic merit function in the design work.
© (1999) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Shin Masui and Takeshi Namioka "Aberration theory and a design method of double-element optical systems", Proc. SPIE 3737, Design and Engineering of Optical Systems II, (27 August 1999); https://doi.org/10.1117/12.360045
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Cited by 3 scholarly publications.
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KEYWORDS
Monochromatic aberrations

Spectral resolution

Monochromators

Aberration theory

Mirrors

Optical design

Optical components

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