Challenge of extending optical lithography

Keith A. Chivers

doi:10.1117/12.346899

28 April 1999 Challenge of extending optical lithography

Keith A. Chivers

Proceedings Volume 3741, Lithography for Semiconductor Manufacturing; (1999) https://doi.org/10.1117/12.346899
Event: Microelectronic Manufacturing Technologies, 1999, Edinburgh, United Kingdom

Abstract

For many generations of integrated circuit technology optical lithography has been used for patterning. Given this dominance the possible limits of optical lithography are examined and the challenges towards reaching these limits are set out. The present and near future technologies are investigated in detail and the more long term technologies are looked into and finally a possible optical lithography exposure system roadmap is constructed.

Citation Download Citation

Keith A. Chivers "Challenge of extending optical lithography", Proc. SPIE 3741, Lithography for Semiconductor Manufacturing, (28 April 1999); https://doi.org/10.1117/12.346899

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