EB_PEC by using OPC software

Kenny Yang

doi:10.1117/12.360197

25 August 1999 EB_PEC by using OPC software

Kenny Yang

Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360197
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan

Abstract

Proximity effect is a major source of CD variation in EB process, many solution had been proposed to solve this problem on EB writer, but it is very difficult to handle all kind of pattern and the pattern environment is getting more and more complex. Recent OPC software is widely used by wafer fab and the speed of computer platform is improved to make it less painful to run the OPC software. It is not much theoretical difference between OPC and EB_PEC for this kind of software, so instead of doing PEC on EB writer, the software EB_PEC may be a good approach.

Citation Download Citation

Kenny Yang "EB_PEC by using OPC software", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360197

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