Evaluation of NLD mask dry etching system

Tatsuya Fujisawa; Takayuki Iwamatsu; Koji Hiruta; Hiroaki Morimoto; Takaei Sasaki; Kazuhide Yamashiro

doi:10.1117/12.360255

25 August 1999 Evaluation of NLD mask dry etching system

Tatsuya Fujisawa, Takayuki Iwamatsu, Koji Hiruta, Hiroaki Morimoto, Takaei Sasaki, Kazuhide Yamashiro

Proceedings Volume 3748, Photomask and X-Ray Mask Technology VI; (1999) https://doi.org/10.1117/12.360255
Event: Photomask and X-Ray Mask Technology VI, 1999, Yokohama, Japan

Abstract

An advanced photomask dry etching system (NLDE-9035 Prototype) has been evaluated. This system adopts new plasma source NLDE, and has a 230 mm mask capability. In this experiment, etching uniformity, selectivity and etching pattern profile were mainly evaluated. Etching uniformity of 20 nm (range) was obtained and good pattern fidelity was confirmed.

Citation Download Citation

Tatsuya Fujisawa, Takayuki Iwamatsu, Koji Hiruta, Hiroaki Morimoto, Takaei Sasaki, and Kazuhide Yamashiro "Evaluation of NLD mask dry etching system", Proc. SPIE 3748, Photomask and X-Ray Mask Technology VI, (25 August 1999); https://doi.org/10.1117/12.360255

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