Polarimetric characterization of Spectralon

Dennis H. Goldstein; David B. Chenault; J. Larry Pezzaniti

doi:10.1117/12.366323

25 October 1999 Polarimetric characterization of Spectralon

Dennis H. Goldstein, David B. Chenault, J. Larry Pezzaniti

Proceedings Volume 3754, Polarization: Measurement, Analysis, and Remote Sensing II; (1999) https://doi.org/10.1117/12.366323
Event: SPIE's International Symposium on Optical Science, Engineering, and Instrumentation, 1999, Denver, CO, United States

Abstract

A polarimetric characterization of the reflective standard material Spectralon is presented. Samples of Spectralon with reflectances of 2 percent, 50 percent, 75 percent and 99 percent were examined. The characterization was accomplished using the Air Force Research Laboratory's spectropolarimeter in reflection mode. Data are presented for the spectral region .65 to 1.0 micrometers. Polarizance was measured for the four Spectralon samples at eight input beam incidence angles. All observations were made from normal to the Spectralon. It was found that as the incidence beam angle increases, the polarizance increases; and as the reflectance of the samples decreases, the polarizance increases.

Citation Download Citation

Dennis H. Goldstein, David B. Chenault, and J. Larry Pezzaniti "Polarimetric characterization of Spectralon", Proc. SPIE 3754, Polarization: Measurement, Analysis, and Remote Sensing II, (25 October 1999); https://doi.org/10.1117/12.366323

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