SVG 157-nm lithography approach

James A. McClay; Michael A. DeMarco; Thomas J. Fahey; Matthew E. Hansen; Bruce A. Tirri

doi:10.1117/12.389006

5 July 2000 SVG 157-nm lithography approach

James A. McClay, Michael A. DeMarco, Thomas J. Fahey, Matthew E. Hansen, Bruce A. Tirri

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Proceedings Volume 4000, Optical Microlithography XIII; (2000) https://doi.org/10.1117/12.389006
Event: Microlithography 2000, 2000, Santa Clara, CA, United States

Abstract

SVG Lithography (SVGL) has instigate da comprehensive program for the development of an advanced 157nm lithography exposure system of processing 70nm critical dimensions. This paper presents the need for 157nm technology to be an evolutionary approach and details the present state of the challenges in the development of 157nm lithography. It also describes the SVGL 157nm program approach and provides some insight into the progress made to date addressing the challenges.

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James A. McClay, Michael A. DeMarco, Thomas J. Fahey, Matthew E. Hansen, and Bruce A. Tirri "SVG 157-nm lithography approach", Proc. SPIE 4000, Optical Microlithography XIII, (5 July 2000); https://doi.org/10.1117/12.389006

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