Textured growth of [100] diamond on Al2O3 ceramic substrate by microwave plasma chemical vapor deposition

Zhijun Fang; Yiben Xia; Jianhua Ju; Linjun Wang; Weli Zhang

doi:10.1117/12.408330

29 November 2000 Textured growth of [100] diamond on Al₂O₃ ceramic substrate by microwave plasma chemical vapor deposition

Zhijun Fang, Yiben Xia, Jianhua Ju, Linjun Wang, Weli Zhang

Author Affiliations +

Proceedings Volume 4086, Fourth International Conference on Thin Film Physics and Applications; (2000) https://doi.org/10.1117/12.408330
Event: 4th International Conference on Thin Film Physics and Applications, 2000, Shanghai, China

Abstract

[100]-textured diamond thin film on a rough and randomly oriented Al₂O₃ substrate has been achieved by MPCVD. The cyclic technique--the cyclic modulation of the H₂ plasma (etching process) and CH₄+H₂ plasma (growing process)--has been applied during the growth stage with various etching/growth time ratios. The dependencies of properties and morphologies of the films on the etching time interval were well explained by the selective etching of hydrogen ions to non-[100]- oriented grains. The strong effects of different methane concentrations and substrate temperatures on the [100]-textured growth were also concluded. Growth mechanisms of [100]-textured diamond thin films on Al₂O₃ substrates were discussed based on the detailed results of Scanning Electron Microscopy, Raman Spectrum and X-ray Diffraction Spectrum.

Citation Download Citation

Zhijun Fang, Yiben Xia, Jianhua Ju, Linjun Wang, and Weli Zhang "Textured growth of [100] diamond on Al₂O₃ ceramic substrate by microwave plasma chemical vapor deposition", Proc. SPIE 4086, Fourth International Conference on Thin Film Physics and Applications, (29 November 2000); https://doi.org/10.1117/12.408330

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