Production of thin film optical coatings with predetermined stress levels

David W. Reicher; Samuel A. McCormack

doi:10.1117/12.405769

31 October 2000 Production of thin film optical coatings with predetermined stress levels

David W. Reicher, Samuel A. McCormack

Proceedings Volume 4091, Imaging Technology and Telescopes; (2000) https://doi.org/10.1117/12.405769
Event: International Symposium on Optical Science and Technology, 2000, San Diego, CA, United States

Abstract

In this investigation a technique was developed for depositing high reflectors of alternating layers of TiO₂ and SiO₂ with varying levels of stress. The TiO₂ layers were deposited by ion assisted electron beam evaporation, and the SiO₂ layers by modulated reactive DC magnetron sputtering. The TiO₂ layers were in tensile stress, and the stress depended on the ion beam current density. The SiO₂ layers were in compressive stress. The total stress in the high reflector coating was controlled by the ion beam current density applied during deposition of the TiO₂ films. The coatings were deposited at a substrate temperature of approximately 50 degrees Celsius. Coating stress levels were unaffected by changes in relative humidity. The stability of the coating over time depended on the density of the TiO₂ layers.

Citation Download Citation

David W. Reicher and Samuel A. McCormack "Production of thin film optical coatings with predetermined stress levels", Proc. SPIE 4091, Imaging Technology and Telescopes, (31 October 2000); https://doi.org/10.1117/12.405769

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