Paper
14 June 2000 Identification of random phase masks in a nonlinear joint transform correlator
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Proceedings Volume 4148, Optoelectronic and Hybrid Optical/Digital Systems for Image and Signal Processing; (2000) https://doi.org/10.1117/12.388442
Event: International Workshop on Optoelectronic and Hybrid Optical/Digital Systems for Image/Signal Processing, 1999, Lviv, Ukraine
Abstract
The procedure for identification of a random phase mask in a nonlinear joint transform correlator containing a photosensitive recording material or a spatial light modulator in a frequency domain is studied. The new approach for estimation the intensities of correlation peaks in such type of a nonlinear correlator is proposed. This approach is based on the use of an experimental dependence of the recording medium's diffraction efficiency versus its exposure. The comparative analysis of correlation peaks produced by phase masks and primary test images in nonlinear joint transform correlators containing different photosensitive recording medium in frequency domains is represented. The results of analysis have shown, that the peak intensities produced by phase masks and by primary images are the same in a linear joint transform correlator, but the peak intensity produced by a phase mask in the nonlinear joint transform correlator is much larger than the peak intensity produced by a primary image.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Leonid I. Muravsky "Identification of random phase masks in a nonlinear joint transform correlator", Proc. SPIE 4148, Optoelectronic and Hybrid Optical/Digital Systems for Image and Signal Processing, (14 June 2000); https://doi.org/10.1117/12.388442
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KEYWORDS
Optical correlators

Diffraction

Spatial light modulators

Joint transforms

Nonlinear optics

Phase modulation

Photosensitive materials

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