Paper
10 October 2000 New progress in shearography
Hong-Min Shi, Shouyong Ni, Lei Fu, Hao Wang
Author Affiliations +
Proceedings Volume 4222, Process Control and Inspection for Industry; (2000) https://doi.org/10.1117/12.403912
Event: Optics and Optoelectronic Inspection and Control: Techniques, Applications, and Instruments, 2000, Beijing, China
Abstract
As common-path interferometers, shearography (shear interferometer) has been widely used in many fields. It has some special advantages as well as some disadvantages. This leads to the result that it can only be used in some special conditions for some special uses. Int his paper, both the advantages and the disadvantages are discussed. Some new progress, such as the phase-shift in shearography, two-dimensional shearography and the phot-carrier in shearography, are proposed. All of these new progress are developed in the aim of extending the application fields, improving the processing accuracy and realizing automatic measurement.
© (2000) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Hong-Min Shi, Shouyong Ni, Lei Fu, and Hao Wang "New progress in shearography", Proc. SPIE 4222, Process Control and Inspection for Industry, (10 October 2000); https://doi.org/10.1117/12.403912
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KEYWORDS
Shearography

Interferometers

Fringe analysis

Polarization

Interferometry

Bismuth

Digital image processing

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