Paper
21 May 2001 Integrated microchip-based nanoelectrospray device for high-throughput mass spectrometry
Thomas N. Corso, Colleen K. Van Pelt, Sheng Zhang, Simon J. Prosser, Gary A. Schultz
Author Affiliations +
Abstract
The emerging field of microfluidics may provide for the rapid, automated analysis of samples. Here we describe the microfabrication and operation of a nanoelectrospray device formed from the planar surface of a monolithic silicon substrate for electrospray mass spectrometry sample analysis at low nanoliter per minute flow rates. To generate a useful electrospray from a microchip, a high aspect ratio nozzle structure of small dimensions is required. Deep reactive ion etching technologies allow these high aspect ratio structures to be fabricated in parallel and are widely available for the etching of silicon.
© (2001) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Thomas N. Corso, Colleen K. Van Pelt, Sheng Zhang, Simon J. Prosser, and Gary A. Schultz "Integrated microchip-based nanoelectrospray device for high-throughput mass spectrometry", Proc. SPIE 4265, Biomedical Instrumentation Based on Micro- and Nanotechnology, (21 May 2001); https://doi.org/10.1117/12.427960
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CITATIONS
Cited by 3 scholarly publications.
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KEYWORDS
Silicon

Etching

Ions

Microfluidics

Statistical analysis

Semiconducting wafers

High aspect ratio silicon micromachining

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