Continuum model of shot noise and line edge roughness

Gregg M. Gallatin

doi:10.1117/12.425198

26 April 2001 Continuum model of shot noise and line edge roughness

Gregg M. Gallatin

Proceedings Volume 4404, Lithography for Semiconductor Manufacturing II; (2001) https://doi.org/10.1117/12.425198
Event: Microelectronic and MEMS Technologies, 2001, Edinburgh, United Kingdom

Abstract

Decreasing feature size implies increased sensitivity to statistical fluctuations which impact critical dimension uniformity and control. In a recent work Gallatin and Liddle presented equations which describe the basic processes leading to surface and line edge roughness in a chemically amplified resists. Retaining only the lowest order terms in what is inherently a very nonlinear problem they were able to derive a scaling law and other dependencies which show reasonable agreement with experimental data. Here the analysis of the same equations is extended and expanded to include the dominant nonlinear effects.

Citation Download Citation

Gregg M. Gallatin "Continuum model of shot noise and line edge roughness", Proc. SPIE 4404, Lithography for Semiconductor Manufacturing II, (26 April 2001); https://doi.org/10.1117/12.425198

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