Nanolithography on silicon surface using a tuning fork STM/AFM

S. Y. Lin; C. C. Fan; D. P. Tsai; F. S.S. Chien; S. Gwo; Wen-Feng Hsieh

doi:10.1117/12.427084

8 May 2001 Nanolithography on silicon surface using a tuning fork STM/AFM

S. Y. Lin, C. C. Fan, D. P. Tsai, F. S.S. Chien, S. Gwo, Wen-Feng Hsieh

Proceedings Volume 4416, Optical Engineering for Sensing and Nanotechnology (ICOSN 2001); (2001) https://doi.org/10.1117/12.427084
Event: Optical Engineering for Sensing and Nanotechnology (ICOSN '01), 2001, Yokohama, Japan

Abstract

A tapping mode atomic force microscopy (AFM)/scanning tunneling microscopy (STM) system using a non-optical tuning fork force sensing method has been developed for the scanning probe lithography. In comparisons with the nanolithography done by AFM with the conductive cantilever tip, our method has the following advantages. (1) It has longer tapered length STM tip and smaller half cone angle to perform the nanometer scale patterning with high aspect ratio. (2) Its low cost tungsten or Pt/Ir STM tip can be easily fabricated and attached to our AFM force sensing tuning fork. (3) It can be easily adapted to large-scale parallel processing because of the all-electric force sensing methods. Nanostructures with high aspect ratios and large depths have been successfully performed on the silicon surface by using our AFM/STM nanopatterning system followed by the differential etching process. Lines with different widths and matrices of dots with various diameters were demonstrated for potential applications.

Citation Download Citation

S. Y. Lin, C. C. Fan, D. P. Tsai, F. S.S. Chien, S. Gwo, and Wen-Feng Hsieh "Nanolithography on silicon surface using a tuning fork STM/AFM", Proc. SPIE 4416, Optical Engineering for Sensing and Nanotechnology (ICOSN 2001), (8 May 2001); https://doi.org/10.1117/12.427084

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