Polysilane Bilayer uv Lithography

Donald C. Hofer; Robert D. Miller; C.Grant Willson

doi:10.1117/12.941772

21 May 1984 Polysilane Bilayer uv Lithography

Donald C. Hofer, Robert D. Miller, C.Grant Willson

Proceedings Volume 0469, Advances in Resist Technology I; (1984) https://doi.org/10.1117/12.941772
Event: 1984 Microlithography Conferences, 1984, Santa Clara, United States

Abstract

Polysilanes are a class of Si-Si backbone polymers that have been demonstrated to function as high resolution positive resists with excellent uv sensitivity. These materials have a unique photochemistry with high quantum yields and nonlinear bleaching. Polysilanes serve as excellent RIE barriers for bilevel resist applications because a protective layer of SiO₂ is formed during exposure to an oxygen plasma. Aliphatic polysilanes have been applied to full wafer mid-uv lithography with 0.75 μm resolution.

Citation Download Citation

Donald C. Hofer, Robert D. Miller, and C.Grant Willson "Polysilane Bilayer uv Lithography", Proc. SPIE 0469, Advances in Resist Technology I, (21 May 1984); https://doi.org/10.1117/12.941772

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