Desirable reticle flatness from focus deviation standpoint optical lithography

Soichi Inoue; Masamitsu Itoh; Masafumi Asano; Katsuya Okumura; Tsuneyuki Hagiwara; Jiro Moriya

doi:10.1117/12.474600

30 July 2002 Desirable reticle flatness from focus deviation standpoint optical lithography

Soichi Inoue, Masamitsu Itoh, Masafumi Asano, Katsuya Okumura, Tsuneyuki Hagiwara, Jiro Moriya

Proceedings Volume 4691, Optical Microlithography XV; (2002) https://doi.org/10.1117/12.474600
Event: SPIE's 27th Annual International Symposium on Microlithography, 2002, Santa Clara, California, United States

Abstract

We performed precise and systematic approaches for clarifying what reticle flatness should be from the standpoint of focal deviation in optical lithography. The impact of reticle warpage on focus deviation was measured by aerial image sensor to obtain tiny reticle-induced focus shift precisely. We clarified the criteria of reticle flatness after chucking. Optimum free-standing shape to become desired shape after chucking was obtained by simulation and analytical approach. The flatness of chucked reticle was found to be determined by both free-standing plate shape inside the reticle holder and plate shape facing the holder. Reticle flatness was newly defined according to the results. Requirements respecting the newly defined flatness for each technology node were clarified from focus budget analysis.

Citation Download Citation

Soichi Inoue, Masamitsu Itoh, Masafumi Asano, Katsuya Okumura, Tsuneyuki Hagiwara, and Jiro Moriya "Desirable reticle flatness from focus deviation standpoint optical lithography", Proc. SPIE 4691, Optical Microlithography XV, (30 July 2002); https://doi.org/10.1117/12.474600

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