Fractional Fourier domain filtering applied to improve image quality in photolithography

Yixiao Zhang; Jinglei Du; Jingguo Yang; Yangsu Zeng; Yongkang Guo; Zheng Cui; Jun Yao

doi:10.1117/12.462880

19 April 2002 Fractional Fourier domain filtering applied to improve image quality in photolithography

Yixiao Zhang, Jinglei Du, Jingguo Yang, Yangsu Zeng, Yongkang Guo, Zheng Cui, Jun Yao

Proceedings Volume 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002; (2002) https://doi.org/10.1117/12.462880
Event: Symposium on Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, 2002, Cannes-Mandelieu, France

Abstract

In this paper, we present a new method to improve the image quality and resolution of photolithography by filtering in fractional Fourier domain. Introducing a filter into fractional Fourier domain can not only increase the flexibility of the filtering operation, but also enhance the image quality and the depth of focus in photolithography. The corresponding simulation results are illustrated.

Citation Download Citation

Yixiao Zhang, Jinglei Du, Jingguo Yang, Yangsu Zeng, Yongkang Guo, Zheng Cui, and Jun Yao "Fractional Fourier domain filtering applied to improve image quality in photolithography", Proc. SPIE 4755, Design, Test, Integration, and Packaging of MEMS/MOEMS 2002, (19 April 2002); https://doi.org/10.1117/12.462880

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