Evaluating scanner lens spherical aberration using scatterometer

Changan Wang; Gary Zhang; Colin L. Tan; Chris Atkinson; Mark A. Boehm; Jay M. Brown; David Godfrey; Michael E. Littau; Christopher J. Raymond

doi:10.1117/12.485437

26 June 2003 Evaluating scanner lens spherical aberration using scatterometer

Changan Wang, Gary Zhang, Colin L. Tan, Chris Atkinson, Mark A. Boehm, Jay M. Brown, David Godfrey, Michael E. Littau, Christopher J. Raymond

Author Affiliations +

Proceedings Volume 5040, Optical Microlithography XVI; (2003) https://doi.org/10.1117/12.485437
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

Lens spherical error is an important lens aberration used to characterize lens quality and also has a significant contribution to across chip line width variation (ACLV). It also impacts tool-to-tool matching efforts especially when the optical lithography approaches sub-half wavelength geometry. Traditionally, spherical error is measured by using CD SEM with known drawbacks of poor accuracy and long cycle time. At Texas Instruments, an in-house scatterometer-based lens fingerprinting technique (ScatterLith) performs this tedious job accurately and quickly. This paper presents across slit spherical aberration signatures for ArF scanners collected using this method. The technique can successfully correlate these signatures with Litel lens aberration data and Nikon OCD data for spherical aberration errors as small as 10mλ. ACLV contributions from such small spherical errors can be quantified using this method. This provides the lithographer with an important tool to evaluate, qualify and match advanced scanners to improve across chip line width variation control.

Citation Download Citation

Changan Wang, Gary Zhang, Colin L. Tan, Chris Atkinson, Mark A. Boehm, Jay M. Brown, David Godfrey, Michael E. Littau, and Christopher J. Raymond "Evaluating scanner lens spherical aberration using scatterometer", Proc. SPIE 5040, Optical Microlithography XVI, (26 June 2003); https://doi.org/10.1117/12.485437

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
9 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Monochromatic aberrations

Spherical lenses

Critical dimension metrology

Scanners

Optical lithography

Semiconducting wafers

Phase measurement

Show All Keywords

Keywords/Phrases

Search In:

Publication Years