Novel manufacturing process of waveguide using selective photobleaching of polysilane films by UV light irradiation

Hiroshi Tsushima; Emi Watanabe; Saori Yoshimatsu; Satoshi Okamoto; Takeshi Oka; Katsuyuki Imoto

doi:10.1117/12.510965

14 August 2003 Novel manufacturing process of waveguide using selective photobleaching of polysilane films by UV light irradiation

Hiroshi Tsushima, Emi Watanabe, Saori Yoshimatsu, Satoshi Okamoto, Takeshi Oka, Katsuyuki Imoto

Author Affiliations +

Proceedings Volume 5246, Active and Passive Optical Components for WDM Communications III; (2003) https://doi.org/10.1117/12.510965
Event: ITCom 2003, 2003, Orlando, Florida, United States

Abstract

We have tried to develop the technology for selective bleaching of core patterns of waveguides on polysilane films by UV light irradiation without wet development and RIE process. Furthermore, we have examined heat treatment of films in order to make transmission loss low instead of introducing fluorine groups in the polymer structure which conventional polymeric material are applied. As a waveguide device, evaluation of low loss straight-line waveguides and multilayered laminating type waveguides at 850nm for MM, and splitter of 8 branches (1×8) at 1550nm for SM was carried out. This new technology is expected to establish the low-cost manufacturing process of optical waveguides which are important components of passive optical devices for PON (passive optical network) system and optical interconnects.

Citation Download Citation

Hiroshi Tsushima, Emi Watanabe, Saori Yoshimatsu, Satoshi Okamoto, Takeshi Oka, and Katsuyuki Imoto "Novel manufacturing process of waveguide using selective photobleaching of polysilane films by UV light irradiation", Proc. SPIE 5246, Active and Passive Optical Components for WDM Communications III, (14 August 2003); https://doi.org/10.1117/12.510965

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