Monitoring the last two (AR) layers in narrow-bandpass filters

Ronald R. Willey

doi:10.1117/12.510715

25 February 2004 Monitoring the last two (AR) layers in narrow-bandpass filters

Ronald R. Willey

Proceedings Volume 5250, Advances in Optical Thin Films; (2004) https://doi.org/10.1117/12.510715
Event: Optical Systems Design, 2003, St. Etienne, France

Abstract

The final corrections which might be made in the last two antireflection (AR) layers in the deposition of narrow bandpass filter designs such as might be used for Dense Wavelength Division Multiplexing (DWDM) in the fiber optics communications field were discussed in a previous report. A broader range of techniques and simulations of those final layer adjustments are described here, how they can be done, and the benefits which might be obtained. A surprisingly simple new technique is given which should yield improved results.

Citation Download Citation

Ronald R. Willey "Monitoring the last two (AR) layers in narrow-bandpass filters", Proc. SPIE 5250, Advances in Optical Thin Films, (25 February 2004); https://doi.org/10.1117/12.510715

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