Paper
30 April 2004 Novel method of fabricating Fabry-Perot cavity employing MEMS wet-etching process
Min Xiang, Yanmin Cai, Yaming Wu, Jianyi Yang, Yuelin Wang
Author Affiliations +
Proceedings Volume 5279, Optical Fibers and Passive Components; (2004) https://doi.org/10.1117/12.521680
Event: Asia-Pacific Optical and Wireless Communications, 2003, Wuhan, China
Abstract
A new method is presented in this paper to fabricate Fabry-Perot (FP) cavity with MEMS bulk wet-etching technology, through which FP cavities can be achieved with the cavity length from several microns to tens of microns. The parallelism of mirror elements can be well achieved without electrostatic control. Some FP cavities were achieved that the insertion loss was less than -8dB, the full width half maximum (FWHM) was about 2 nm, and the efficient finesse is up to 50. Some factors which influence the finesse have also been analyzed. The further work is ongoing.
© (2004) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Min Xiang, Yanmin Cai, Yaming Wu, Jianyi Yang, and Yuelin Wang "Novel method of fabricating Fabry-Perot cavity employing MEMS wet-etching process", Proc. SPIE 5279, Optical Fibers and Passive Components, (30 April 2004); https://doi.org/10.1117/12.521680
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KEYWORDS
Semiconducting wafers

Mirrors

Silicon

Microelectromechanical systems

Polishing

Fabry–Perot interferometers

Surface finishing

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