Reticle Sizing For Optimized CD Control

Terry V. Nordstrom

doi:10.1117/12.947747

23 July 1985 Reticle Sizing For Optimized CD Control

Terry V. Nordstrom

Proceedings Volume 0538, Optical Microlithography IV; (1985) https://doi.org/10.1117/12.947747
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

The effect of reticle sizing has been characterized for a single layer resist process employing a hotplate postexposure bake. Results are presented which show optimum CD control is obtained for feature sizing .25 to .3 microns less than the reticle size for clear field reticles. Process margins relative to exposure dose, topography and focus are presented.

Citation Download Citation

Terry V. Nordstrom "Reticle Sizing For Optimized CD Control", Proc. SPIE 0538, Optical Microlithography IV, (23 July 1985); https://doi.org/10.1117/12.947747

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