Magnetic properties of direct current magnetron sputtered thin nickel films

A. V. Butko; A. S. Dzhumaliev; Yu. A. Filimonov; A. V. Kozhevnikov; S. L. Vysotsky; S. N. Vasiltchenko

doi:10.1117/12.562663

28 May 2004 Magnetic properties of direct current magnetron sputtered thin nickel films

A. V. Butko, A. S. Dzhumaliev, Yu. A. Filimonov, A. V. Kozhevnikov, S. L. Vysotsky, S. N. Vasiltchenko

Proceedings Volume 5401, Micro- and Nanoelectronics 2003; (2004) https://doi.org/10.1117/12.562663
Event: Micro- and Nanoelectronics 2003, 2003, Zvenigorod, Russian Federation

Abstract

The structure and magnetic properties of thin nickel films grown by direct current magnetron sputtering on GaAs(100) and Si(111) substrates were studied by means of ferromagnetic resonance (FMR) method, magnetooptic Kerr effect (MOKE), atomic force microscopy (AFM) and X-ray diffraction (XRD). Dependence of the properties on substrate location inside flame zone during deposition was shown. Possibility of changing of the films' texture by varying of potential of the substrate during deposition was shown.

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A. V. Butko, A. S. Dzhumaliev, Yu. A. Filimonov, A. V. Kozhevnikov, S. L. Vysotsky, and S. N. Vasiltchenko "Magnetic properties of direct current magnetron sputtered thin nickel films", Proc. SPIE 5401, Micro- and Nanoelectronics 2003, (28 May 2004); https://doi.org/10.1117/12.562663

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