Photolithography for the static compensation of human eye aberrations

Salvador Bara; Zbigniew Jaroszewicz

doi:10.1117/12.577111

26 August 2004 Photolithography for the static compensation of human eye aberrations

Salvador Bara, Zbigniew Jaroszewicz

Proceedings Volume 5566, Optical Security and Safety; (2004) https://doi.org/10.1117/12.577111
Event: Optical Security and Safety, 2003, Warsaw, Poland

Abstract

Recent developments in human eye aberration measurements allow to design and fabricate compensating elements aiming to achieve aberration-limited imaging. This is important not merely from a subject's viewpoint (improving the sharpness of the outer world images formed at the retina) but mainly for clinical instrumentation purposes, especially those dealing with high-resolution retinal imaging (eye fundus cameras, scanning laser ophtlalmosopes, etc.). Here we report recent developments in the correction of the static component of the eye aberrations. Aberration data of several subjects were used for manufacturing personally customized phase plates designed to compensate for the wave aberration in the human eye. These plates were made by gray-level single-mask photosculpture in photoresist and then placed in front of the eye. The effects of misalignments as well as the strategy to design wide-field correcting elements are briefly revised. Applications include improving images in scanning laser ophtalmoscopes. The future plans of research including application of axicons for compensation of the lack of accommodation and kinoforms cancelling high amounts of eye's aberrations in monochromatic illumination are also sketched.

Citation Download Citation

Salvador Bara and Zbigniew Jaroszewicz "Photolithography for the static compensation of human eye aberrations", Proc. SPIE 5566, Optical Security and Safety, (26 August 2004); https://doi.org/10.1117/12.577111

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