Influences of the residual argon gas and thermal annealing on Ta2O5 and SiO2 thin film filters

Wen-Jen Liu; Chih-Min Chen; Yin-Chieh Lai

doi:10.1117/12.590055

4 April 2005 Influences of the residual argon gas and thermal annealing on Ta₂O₅ and SiO₂ thin film filters

Wen-Jen Liu, Chih-Min Chen, Yin-Chieh Lai

Proceedings Volume 5723, Optical Components and Materials II; (2005) https://doi.org/10.1117/12.590055
Event: Integrated Optoelectronic Devices 2005, 2005, San Jose, California, United States

Abstract

Ion beam assisted deposition (IBAD) technique had widely used for improving stacking density and atomic mobility of thin films in many applications, especially adopted in optical film industries. Tantalum pentaoxide (Ta₂O₅) and silicon oxides (SiO₂) optical thin films were deposited on the quartz glass substrate by using argon ion beam assisted deposition, and the influences of the residual argon gas and thermal annealing processes on the optical property, stress, compositional and microstructure evolution of the thin films were investigated in this study. Ta₂O₅ thin films were analyzed by XPS indicated that the ratio value of oxygen to tantalum was insufficient, at the same time, the residual argon gas in the thin films might result in film and device instabilities. Adopting oxygen-thermal annealing treatment at the temperature of 425°C, the thin films not only decreased the residual argon gas and the surface roughness, but also provided the sufficient stoichiometric ratio. Simultaneously, microstructure examination indicated few nano-crystallized structures and voids existed in Ta₂O₅ thin films, and possessed reasonable refractive index and lower extinction coefficient. By the way, we also suggested the IBAD system using the film compositional gas ion beam to replace the argon ion beam for assisting deposited optical films. The designed (HL)⁶H6LH(LH)⁶ multi-layers indicated higher insertion loss than the designed (HL)⁶8H(LH)⁶ multi-layers. Therefore, using the high refractive index as spacer material represented lower insertion loss.

Citation Download Citation

Wen-Jen Liu, Chih-Min Chen, and Yin-Chieh Lai "Influences of the residual argon gas and thermal annealing on Ta₂O₅ and SiO₂ thin film filters", Proc. SPIE 5723, Optical Components and Materials II, (4 April 2005); https://doi.org/10.1117/12.590055

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