Polarization impact on partially coherent imaging

Gek Soon Chua; Cho Jui Tay; Chenggen Quan; Qunying Lin

doi:10.1117/12.600415

12 May 2005 Polarization impact on partially coherent imaging

Gek Soon Chua, Cho Jui Tay, Chenggen Quan, Qunying Lin

Proceedings Volume 5754, Optical Microlithography XVIII; (2005) https://doi.org/10.1117/12.600415
Event: Microlithography 2005, 2005, San Jose, California, United States

Abstract

Image formation and analyses in optical lithography illuminated with partially coherent polarized light are explored. The influence of polarization on the image formation of one-dimensional periodic patterns has been investigated and qualitatively understood by using the concept of the transmission cross-coefficient and coherency factor σ_c. Three types of imaging are considered for line/space patterns: (1) 3-beam imaging (conventional imaging), (2) 2-beam imaging (Levenson type phase-shifting), and (3) the imaging with the 0^th and either the -1^st or the +1^st orders of diffracted waves (off-axis illumination). Results show that the aerial images are affected by polarization state in (2) and (3) at high numerical apertures. The illumination light polarized parallel to the lines and spaces gave much higher image qualities than the illumination polarized perpendicular to the lines and spaces. This suggests that it is possible to further improve the resolution of an optical system by controlling the polarization besides using phase-shifting masks or off-axis illumination. We studied the effects of polarized light on immersion lithography using alternating PSM, employing conventional and dipole illumination.

Citation Download Citation

Gek Soon Chua, Cho Jui Tay, Chenggen Quan, and Qunying Lin "Polarization impact on partially coherent imaging", Proc. SPIE 5754, Optical Microlithography XVIII, (12 May 2005); https://doi.org/10.1117/12.600415

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KEYWORDS

Polarization

Lithographic illumination

Photomasks

Phase shifts

Optical lithography

Immersion lithography

Image quality

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