A novel method for measuring the thickness of optical wave plate

Weiwei Feng; Lihuang Lin

doi:10.1117/12.666856

9 December 2005 A novel method for measuring the thickness of optical wave plate

Weiwei Feng, Lihuang Lin

Proceedings Volume 6024, ICO20: Optical Devices and Instruments; 60241B (2005) https://doi.org/10.1117/12.666856
Event: ICO20:Optical Devices and Instruments, 2005, Changchun, China

Abstract

Based on chromatic polarization interferometry, a novel method for measuring the thickness of optical wave plate is presented. When the resolution power of spectrometer reaches 0.01nm, the measuring precision of the thickness is better than 0.1μm.

Citation Download Citation

Weiwei Feng and Lihuang Lin "A novel method for measuring the thickness of optical wave plate", Proc. SPIE 6024, ICO20: Optical Devices and Instruments, 60241B (9 December 2005); https://doi.org/10.1117/12.666856

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