Paper
9 June 2006 Profilometer with sub-nanometer resolution for on-line measurement of fine optical surfaces
Zhao-fei Zhou, Wei Huang, Tao Zhang
Author Affiliations +
Proceedings Volume 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies; 61490Z (2006) https://doi.org/10.1117/12.674223
Event: 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies, 2005, Xian, China
Abstract
The profilometer for on-line and non-contact measurement of the fine optical surfaces is described in this paper, which works on the principle of the differential interferometry with coaxial interference arms. The optical part of that is isolated and easy to install on the machine tools or the measuring machineries ea. This profilometer has excellent resistance to disturbance, especially to mechanical vibration, when the amplitude of vibration is about 300nm. So it still can be used to measure the micro-profile with sub-nanometer resolution. The vertical resolution of the profilometer is better than 0.05 nm rms. and need not add any condition or pretreatment
© (2006) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Zhao-fei Zhou, Wei Huang, and Tao Zhang "Profilometer with sub-nanometer resolution for on-line measurement of fine optical surfaces", Proc. SPIE 6149, 2nd International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies, 61490Z (9 June 2006); https://doi.org/10.1117/12.674223
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KEYWORDS
Profilometers

Calcite

Optical testing

Resistance

Phase measurement

Prisms

Avalanche photodiodes

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