Paper
7 March 2007 Three-dimensional diffractive micro- and nano-optical elements fabricated by electron-beam lithography
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Abstract
The broad development of the micro- and nano-technologies in the past few years increased the need of techniques capable of fabricating sub-micron structures with arbitrary surface profiles. Out of the several fabrication approaches (HEBS lithography, laser writing, etc.) the electron beam writing stands out as the one capable of the highest resolution, superior alignment accuracy and very small surface roughness. These characteristics make the technique greatly applicable in the fields of photonics and micro-opto-electro-mechanical-systems (MOEMS). Here we describe the specificity of fabricating 3D diffractive micro- and nano-optical elements using Leica EBPG 5000+ electron beam system. Parameters like speed of writing, dose accumulation, pattern writing specifics, etc. affect greatly the electronbeam resist properties and the desired 3D profile. We present data that can be used to better understand the different dependencies and therefore achieve better profile and surface roughness management. The results can be useful in future developments in the areas of integrated photonic circuits and MOEMS.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Ivan B. Divliansky and Eric G. Johnson "Three-dimensional diffractive micro- and nano-optical elements fabricated by electron-beam lithography", Proc. SPIE 6462, Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII, 64621B (7 March 2007); https://doi.org/10.1117/12.700999
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Cited by 5 scholarly publications.
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KEYWORDS
Electron beams

Lithography

Diffraction gratings

Polymers

Analog electronics

Thermal effects

Nanolithography

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