Implementation of far-field phase-shift lithography using diffractive optical elements

Wei-Feng Hsu; Yuan-Hong Su

doi:10.1117/12.699950

7 March 2007 Implementation of far-field phase-shift lithography using diffractive optical elements

Wei-Feng Hsu, Yuan-Hong Su

Proceedings Volume 6462, Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII; 64621C (2007) https://doi.org/10.1117/12.699950
Event: MOEMS-MEMS 2007 Micro and Nanofabrication, 2007, San Jose, California, United States

Abstract

We proposed a method, which is the first to our knowledge, to realize the phase-shift patterns of the near-field lithography in the optical far field. The key component of the optical Fourier system was a phase-only diffractive optical element which generated a diffracted light field of a semi-phase-only complex-valued function. The achieved feature size was beyond the diffraction limit. The advantages of the proposed method included the capability to generate the complicated patterns, spatial parallelism, and low cost.

Citation Download Citation

Wei-Feng Hsu and Yuan-Hong Su "Implementation of far-field phase-shift lithography using diffractive optical elements", Proc. SPIE 6462, Micromachining Technology for Micro-Optics and Nano-Optics V and Microfabrication Process Technology XII, 64621C (7 March 2007); https://doi.org/10.1117/12.699950

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