DRC and mask friendly pattern and probe aberration monitors

Juliet Holwill; Andrew R. Neureuther

doi:10.1117/12.712383

21 March 2007 DRC and mask friendly pattern and probe aberration monitors

Proceedings Volume 6521, Design for Manufacturability through Design-Process Integration; 65211U (2007) https://doi.org/10.1117/12.712383
Event: SPIE Advanced Lithography, 2007, San Jose, California, United States

Abstract

This paper considers modifications of the Pattern-and-Probe monitors to make them suitable for including within the circuit design as drop in monitors for the lithography process. Nonidealities such as lens aberrations can be monitored through patterns derived from the Zernike polynomials. However, the non-Manhattan geometries produced by this theoretical method are not mask friendly, and in fact took many hours to manufacture in their first attempt. This paper presents modifications to original aberration monitors to allow them to pass DRC checks and thus be more mask-friendly. Additionally, the original patterns' quantitative interpretation also requires over exposure sequences, special SEM reading of dots instead of linewidth, and separate calibration of the EM performance of the central reference probe. The principles expressed in the original aberration monitors can be integrated into more traditional circuit layouts to create more processing acceptable patterns, with the example shown in this paper retaining 68% of it sensitivity and no decrease in orthogonality.

Citation Download Citation

Juliet Holwill and Andrew R. Neureuther "DRC and mask friendly pattern and probe aberration monitors", Proc. SPIE 6521, Design for Manufacturability through Design-Process Integration, 65211U (21 March 2007); https://doi.org/10.1117/12.712383

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