Formation of 4-beam laser interference patterns for nanolithography

Jin Zhang; Zuobin Wang; Yury K. Verevkin; Santiago M. Olaizola; Changsi Peng; Chunlei Tan; Ainara Rodriguez; Eric Y. Daume; Thierry Berthou; Stéphane Tisserand; Ze Ji

doi:10.1117/12.723782

12 June 2007 Formation of 4-beam laser interference patterns for nanolithography

Jin Zhang, Zuobin Wang, Yury K. Verevkin, Santiago M. Olaizola, Changsi Peng, Chunlei Tan, Ainara Rodriguez, Eric Y. Daume, Thierry Berthou, Stéphane Tisserand, Ze Ji

Author Affiliations +

Proceedings Volume 6593, Photonic Materials, Devices, and Applications II; 65930I (2007) https://doi.org/10.1117/12.723782
Event: Microtechnologies for the New Millennium, 2007, Maspalomas, Gran Canaria, Spain

Abstract

This paper presents a theoretical analysis of formation of 4-beam laser interference patterns for nanolithography. Parameters of 4-beam interference patterns including the pattern amplitude, period, orientation and uniformity were discussed. Analytical expressions were obtained for the spatial distribution of radiation of the interfering beams as a function of their amplitudes, phases, angles of incidence on the sample, and polarization planes with computer simulation and experimental results.

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Jin Zhang, Zuobin Wang, Yury K. Verevkin, Santiago M. Olaizola, Changsi Peng, Chunlei Tan, Ainara Rodriguez, Eric Y. Daume, Thierry Berthou, Stéphane Tisserand, and Ze Ji "Formation of 4-beam laser interference patterns for nanolithography", Proc. SPIE 6593, Photonic Materials, Devices, and Applications II, 65930I (12 June 2007); https://doi.org/10.1117/12.723782

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