Approach to analyze decomposition impact for photomask fabrication

Nobuhito Toyama; Takashi Adachi; Yuichi Inazuki; Takanori Sutou; Takaharu Nagai; Yasutaka Morikawa; Hiroshi Mohri; Naoya Hayashi

doi:10.1117/12.729022

15 May 2007 Approach to analyze decomposition impact for photomask fabrication

Nobuhito Toyama, Takashi Adachi, Yuichi Inazuki, Takanori Sutou, Takaharu Nagai, Yasutaka Morikawa, Hiroshi Mohri, Naoya Hayashi

Author Affiliations +

Proceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 660733 (2007) https://doi.org/10.1117/12.729022
Event: Photomask and Next-Generation Lithography Mask Technology XIV, 2007, Yokohama, Japan

Abstract

Double patterning technology (DPT) is one of candidates to achieve 45nm or 32nm half-pitch and is getting popular as ITRS2006update⁽¹⁾. ITRS2006update specifies the tight specification of image-placement and the difference of CD mean-to target of two masks, and they are also evaluated and reported⁽²⁾. From photomask fabrication viewpoint or just even employing actual wafer exposure experiment, it's much difficult to evaluate actual impact on wafer using DPT. Because what observed on wafer is mixture of not only photomask-property but also exposure's one and new topic of hard-mask process'. In this paper, one evaluation procedure will be proposed using actual two photomasks and the DPT impact on wafer just from two photomasks will be demonstrated. Then the approach of wafer image composing procedure with photomask-SEM image, photomask measurement and exposure simulation will be discussed

Citation Download Citation

Nobuhito Toyama, Takashi Adachi, Yuichi Inazuki, Takanori Sutou, Takaharu Nagai, Yasutaka Morikawa, Hiroshi Mohri, and Naoya Hayashi "Approach to analyze decomposition impact for photomask fabrication", Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 660733 (15 May 2007); https://doi.org/10.1117/12.729022

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available