Paper
1 November 2007 CD-signature evaluation using scatterometry
Jan Richter, Phillipp Laube, John Lam
Author Affiliations +
Abstract
The current abilities for active feedback loops to correct for various parameters challenge metrology groups to provide exact input data for these correction cycles. One of the most important feedback loops is the one that deals with the improvement of the CD (critical dimension) uniformity of structures. Here, several processes rely on exact metrology data to tackle systematic effects that either have to be overcome by finding better process conditions or compensated actively, for instance, by tuning the writer data. Right now most of these processes tackle long range effects on the order of millimetres and do not vary a lot on the micrometer scale. On the other hand, CD measurements are usually performed with instruments that measure single points with dimensions of a couple of micrometers (such as the conventional CD-SEM). Thus noise from the micrometer scale is introduced in the global mapping of the uniformity. Recently, numerical methods, such as the exponentially weighted penalty approach called TPS (thin plate splines) have been developed that separate between the true signatures on the millimetre scale from the noise of the micrometer measurements. In this paper, we will take one step further by showing that the acquired statistically stable CD signature of a CD-SEM measurement matches the CD data measured by a scatterometer. Furthermore, we will show that the residual of the CD data of the scatterometer measurement compared to the found TPS fit has a noise level of about 0.1 nm (3σ), which essentially equals the short-term reproducibility of the tool. This is of high importance since both methods do essentially the same - they average out micrometer noise with the only difference being that TPS does it theoretically and a scatterometer does experimentally. Thus, we have the extremely fortunate situation in which theory and experiment give the same results. Hence, two separate conclusions can be drawn: the scatterometer measures indeed stable macroscopic CD signatures and TPS is indeed the right method to extract these signatures from any given CD data.
© (2007) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Jan Richter, Phillipp Laube, and John Lam "CD-signature evaluation using scatterometry", Proc. SPIE 6730, Photomask Technology 2007, 67304R (1 November 2007); https://doi.org/10.1117/12.741263
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CITATIONS
Cited by 2 scholarly publications.
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KEYWORDS
Critical dimension metrology

Scatterometry

Scatter measurement

Metrology

Photomasks

Data corrections

Data modeling

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