Polysilane-based 3D waveguides for optical interconnects

Kouhei Ogura; Takeshi Oka; Emi Watanabe; Kazunori Aoi; Hiroshi Tsushima; Hiroaki Okano; Shuji Suzuki; Seiki Hiramatsu

doi:10.1117/12.762655

12 February 2008 Polysilane-based 3D waveguides for optical interconnects

Kouhei Ogura, Takeshi Oka, Emi Watanabe, Kazunori Aoi, Hiroshi Tsushima, Hiroaki Okano, Shuji Suzuki, Seiki Hiramatsu

Proceedings Volume 6891, Organic Photonic Materials and Devices X; 68910Q (2008) https://doi.org/10.1117/12.762655
Event: Integrated Optoelectronic Devices 2008, 2008, San Jose, California, United States

Abstract

We have been developing the optical waveguide for the multimode using the photo-bleaching property of polysilane. The refractive index of polysilane can be easily changed by exposing to UV light as photobleaching. Using this property, we can make waveguide with simple processes as spin coating, exposing and annealing. We found that this waveguide has thermal adhesive property with glass substrate. And we applied this feature to fabricate multilayered optical waveguides that have three-dimensional structure and can change the optical light at right angle.

Citation Download Citation

Kouhei Ogura, Takeshi Oka, Emi Watanabe, Kazunori Aoi, Hiroshi Tsushima, Hiroaki Okano, Shuji Suzuki, and Seiki Hiramatsu "Polysilane-based 3D waveguides for optical interconnects", Proc. SPIE 6891, Organic Photonic Materials and Devices X, 68910Q (12 February 2008); https://doi.org/10.1117/12.762655

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