Optical proximity correction for elongated contact-hole printing

Young-Chang Kim; Sangwook Kim; Sungsoo Suh; Yongjin Cheon; Sukjoo Lee; Junghyeon Lee; Seong-Woon Choi; Woosung Han; Sooryong Lee; Kyoil Koo

doi:10.1117/12.773819

12 March 2008 Optical proximity correction for elongated contact-hole printing

Young-Chang Kim, Sangwook Kim, Sungsoo Suh, Yongjin Cheon, Sukjoo Lee, Junghyeon Lee, Seong-Woon Choi, Woosung Han, Sooryong Lee, Kyoil Koo

Author Affiliations +

Proceedings Volume 6924, Optical Microlithography XXI; 69243Q (2008) https://doi.org/10.1117/12.773819
Event: SPIE Advanced Lithography, 2008, San Jose, California, United States

Abstract

Optical proximity correction (OPC) of contact-hole printing is challenging since its two dimensional shapes requires through understanding of lithographic processes compared to one dimensional line and space pattering. Moreover, recently, it is common to use "elongated contact holes" with large contact area, rather than simple circular ones, for small electrical resistance. These elongated contact holes make it even more difficult to generate a good OPC model than the circular ones because the elongated contact-hole patterning causes the asymmetric process effects. For example, impacts of mask CD error, resist diffusion and resist development are different depending on the orientation of the elongated contact holes. This paper presents how the OPC model for the elongated contact-hole can be improved as the mask CD error compensation, accurate resist diffusion model and a new Variable Threshold Model (VTM) are applied for the asymmetric process effects.

Citation Download Citation

Young-Chang Kim, Sangwook Kim, Sungsoo Suh, Yongjin Cheon, Sukjoo Lee, Junghyeon Lee, Seong-Woon Choi, Woosung Han, Sooryong Lee, and Kyoil Koo "Optical proximity correction for elongated contact-hole printing", Proc. SPIE 6924, Optical Microlithography XXI, 69243Q (12 March 2008); https://doi.org/10.1117/12.773819

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available