Paper
19 May 2008 Mask transmission resonance in bi-layer masks
Author Affiliations +
Abstract
We report on the experimental observation of mask transmission resonances in line/space gratings on bi-layer mask stacks and on the validation by mask 3D lithographic simulations. The mask transmission resonances manifest themselves as a local enhancement in the dose-to-size curve through mask line width for a given pitch targeted to a fixed wafer CD. We observed this resonance in gratings on a bi-layer Ta/SiON 1% attenuated phase shift mask (att.PSM). We relate the finding to a local transmission loss of the propagating diffraction orders in this range of mask line widths. This resonant-type anomaly has a large impact on the imaging performance of the mask stack. The through-mask-line-width behavior of the mask error enhancement factor (MEEF) shows strong variations and even negative MEEF values around the position of this resonance, which stem from the local dose-to-size enhancement. More precisely, the behavior of the MEEF can be well predicted by the differential of the dose-to-size curve. In this study we investigate both by experiments and simulations the dependency of this mask transmission resonance on various lithographic conditions such as incidence angle and polarization state of the incoming light, grating pitch, and mask material. Based on our findings we provide an explanation of the underlying optical mechanism.
© (2008) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Vicky Philipsen, Peter De Bisschop, and Kei Mesuda "Mask transmission resonance in bi-layer masks", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 702815 (19 May 2008); https://doi.org/10.1117/12.793046
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Cited by 2 scholarly publications.
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KEYWORDS
Photomasks

Diffraction

Semiconducting wafers

Lithography

Dielectrics

Diffraction gratings

Quartz

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