A practical solution to the critical problem of 193 nm reticle haze

David L. Halbmaier; Yasushi Ohyashiki; Oleg Kishkovich

doi:10.1117/12.799669

19 May 2008 A practical solution to the critical problem of 193 nm reticle haze

David L. Halbmaier, Yasushi Ohyashiki, Oleg Kishkovich

Proceedings Volume 7028, Photomask and Next-Generation Lithography Mask Technology XV; 70282G (2008) https://doi.org/10.1117/12.799669
Event: Photomask and NGL Mask Technology XV, 2008, Yokohama, Japan

Abstract

This paper summarizes the dramatic results achieved through the use of novel reticle haze prevention techniques and new equipment which have enabled these results. Near continuous XCDA® purge of reticle pods coupled with integrated pod purifiers resulted in the elimination of reticle haze defects for the usable production life of reticles.

Citation Download Citation

David L. Halbmaier, Yasushi Ohyashiki, and Oleg Kishkovich "A practical solution to the critical problem of 193 nm reticle haze", Proc. SPIE 7028, Photomask and Next-Generation Lithography Mask Technology XV, 70282G (19 May 2008); https://doi.org/10.1117/12.799669

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