Aberrations in curved x-ray multilayers

Ch. Morawe; J.-P. Guigay; V. Mocella; C. Ferrero; H. Mimura; S. Handa; K. Yamauchi

doi:10.1117/12.794534

3 September 2008 Aberrations in curved x-ray multilayers

Ch. Morawe, J.-P. Guigay, V. Mocella, C. Ferrero, H. Mimura, S. Handa, K. Yamauchi

Proceedings Volume 7077, Advances in X-Ray/EUV Optics and Components III; 70770T (2008) https://doi.org/10.1117/12.794534
Event: Optical Engineering + Applications, 2008, San Diego, California, United States

Abstract

Aberration effects in curved multilayers for hard X rays are studied using a simple analytical approach. The method is based on geometrical ray tracing including refraction effects up to the first order of the refractive index decrement δ. The interpretation of the underlying equations provides fundamental insight into the focusing properties of these devices. Using realistic values for the multilayer parameters the impact on spot broadening and chromaticity is evaluated. The work is complemented by a comparison with experimental focusing results obtained with a W/B₄C multilayer mirror.

Citation Download Citation

Ch. Morawe, J.-P. Guigay, V. Mocella, C. Ferrero, H. Mimura, S. Handa, and K. Yamauchi "Aberrations in curved x-ray multilayers", Proc. SPIE 7077, Advances in X-Ray/EUV Optics and Components III, 70770T (3 September 2008); https://doi.org/10.1117/12.794534

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