Holographic scattering in phenanthrenequinone-doped poly(methyl methacrylate) bulk photopolymers

Hongpeng Liu; Dan Yu; Xiudong Sun

doi:10.1117/12.822231

19 March 2009 Holographic scattering in phenanthrenequinone-doped poly(methyl methacrylate) bulk photopolymers

Hongpeng Liu, Dan Yu, Xiudong Sun

Proceedings Volume 7125, Eighth International Symposium on Optical Storage and 2008 International Workshop on Information Data Storage; 71250G (2009) https://doi.org/10.1117/12.822231
Event: Eighth International Symposium on Optical Storage and 2008 International Workshop on Information Data Storage, 2008, Wuhan, China

Abstract

This paper presented an experimental study of holographic scattering caused by noise gratings recorded in the PQ-PMMA photopolymers. Dependence of the thickness and temperature on the holographic scattering losses was evaluated. It is found that the scattering losses increased as the thickness and temperature. According to the relationship between the polymerization rate and exposure, the optimal material parameters thickness 2mm and the temperature 20-30°C were obtained for avoiding the buildup of strong noise gratings.

Citation Download Citation

Hongpeng Liu, Dan Yu, and Xiudong Sun "Holographic scattering in phenanthrenequinone-doped poly(methyl methacrylate) bulk photopolymers", Proc. SPIE 7125, Eighth International Symposium on Optical Storage and 2008 International Workshop on Information Data Storage, 71250G (19 March 2009); https://doi.org/10.1117/12.822231

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