Precise evaluation of zero-CTE temperature of EUVL-grade TiO2-SiO2 ultra-low-expansion glass using the line-focus-beam ultrasonic material characterization system

Jun-ichi Kushibiki; Mototaka Arakawa

doi:10.1117/12.814179

18 March 2009 Precise evaluation of zero-CTE temperature of EUVL-grade TiO₂-SiO₂ ultra-low-expansion glass using the line-focus-beam ultrasonic material characterization system

Jun-ichi Kushibiki, Mototaka Arakawa

Author Affiliations +

Proceedings Volume 7271, Alternative Lithographic Technologies; 72713D (2009) https://doi.org/10.1117/12.814179
Event: SPIE Advanced Lithography, 2009, San Jose, California, United States

Abstract

This paper presents a calibration line between leaky surface acoustic wave (LSAW) velocities (VLSAW) and coefficient-of-thermal-expansion (CTE) characteristics for TiO₂-doped SiO₂ (TiO₂-SiO₂) glass to evaluate the absolute CTE by the line-focus-beam ultrasonic material characterization (LFB-UMC) system. Commercial TiO₂-SiO₂ ultra-low-expansion glass and synthetic silica glass were selected as specimens. We measured V_LSAW by the LFB-UMC system and CTE characteristics by dilatometers, and obtained relationships among VLSAW, CTE at 22°C {CTE(22°C)} and zero-CTE temperature {T(zero-CTE)}. Resolutions of CTE(22°C) and T(zero-CTE) determined by the LSAW velocity measurement were estimated as ±0.72 (ppb/K) and ±0.14°C (±2σ, σ. standard deviation) at 225 MHz. Both manufacturers and users can precisely inspect T(zero-CTE) for all EUVL-grade ultra-low-expansion glass substrates by this indirect evaluation method using the calibration line.

Citation Download Citation

Jun-ichi Kushibiki and Mototaka Arakawa "Precise evaluation of zero-CTE temperature of EUVL-grade TiO₂-SiO₂ ultra-low-expansion glass using the line-focus-beam ultrasonic material characterization system", Proc. SPIE 7271, Alternative Lithographic Technologies, 72713D (18 March 2009); https://doi.org/10.1117/12.814179

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