Silicon cladding for mirror substrates

Christopher J. Duston; Nilesh Gunda; Jay R. Schwartz; Joseph L. Robichaud

doi:10.1117/12.827032

21 August 2009 Silicon cladding for mirror substrates

Christopher J. Duston, Nilesh Gunda, Jay R. Schwartz, Joseph L. Robichaud

Proceedings Volume 7425, Optical Materials and Structures Technologies IV; 74250C (2009) https://doi.org/10.1117/12.827032
Event: SPIE Optical Engineering + Applications, 2009, San Diego, California, United States

Abstract

To reduce the finishing costs of silicon carbide mirror substrates, silicon claddings are applied allowing the surfaces to be more easily diamond turned and polished than the bare chemical vapor deposited (CVD) silicon carbide or bimodal reaction bonded SiC (RB-SiC). The benefits of using silicon as the optical face will be reviewed as will the process for applying plasma enhanced chemical vapor (PE-CVD) deposited amorphous silicon cladding on substrates. Using one mirror as an example, the successful finishing results will be shared.

Citation Download Citation

Christopher J. Duston, Nilesh Gunda, Jay R. Schwartz, and Joseph L. Robichaud "Silicon cladding for mirror substrates", Proc. SPIE 7425, Optical Materials and Structures Technologies IV, 74250C (21 August 2009); https://doi.org/10.1117/12.827032

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