Laser-induced damage thresholds in silica glasses at different temperature

K. Mikami; S. Motokoshi; M. Fujita; T. Jitsuno; J. Kawanaka; R. Yasuhara

doi:10.1117/12.836350

31 December 2009 Laser-induced damage thresholds in silica glasses at different temperature

K. Mikami, S. Motokoshi, M. Fujita, T. Jitsuno, J. Kawanaka, R. Yasuhara

Proceedings Volume 7504, Laser-Induced Damage in Optical Materials: 2009; 75041R (2009) https://doi.org/10.1117/12.836350
Event: Laser Damage Symposium XLI: Annual Symposium on Optical Materials for High Power Lasers, 2009, Boulder, Colorado, United States

Abstract

The laser-induced damage thresholds in silica glasses at different temperature conditions (123 K - 473 K) by Nd:YAG laser fundamental (wavelength 1064 nm) and third harmonic (wavelength 355 nm) 4 ns of pulses were measured. In the results, the damage thresholds increased at low temperature. At 1064 nm, the temperature dependence became strong by the concentration of impurities. However, at 355 nm, the temperature dependences of almost sample were almost the same for different concentration of impurities.

Citation Download Citation

K. Mikami, S. Motokoshi, M. Fujita, T. Jitsuno, J. Kawanaka, and R. Yasuhara "Laser-induced damage thresholds in silica glasses at different temperature", Proc. SPIE 7504, Laser-Induced Damage in Optical Materials: 2009, 75041R (31 December 2009); https://doi.org/10.1117/12.836350

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