Recent advancements in technology of compact laser plasma EUV sources

Henryk Fiedorowicz; Andrzej Bartnik; Roman Jarocki; Jerzy Kostecki; Ladislav Pina; Mirosław Szczurek; Przemysław Wachulak

doi:10.1117/12.841715

17 February 2010 Recent advancements in technology of compact laser plasma EUV sources

Henryk Fiedorowicz, Andrzej Bartnik, Roman Jarocki, Jerzy Kostecki, Ladislav Pina, Mirosław Szczurek, Przemysław Wachulak

Author Affiliations +

Proceedings Volume 7584, Laser Applications in Microelectronic and Optoelectronic Manufacturing XV; 75840U (2010) https://doi.org/10.1117/12.841715
Event: SPIE LASE, 2010, San Francisco, California, United States

Abstract

The recent advancements in technology of compact laser plasma EUV sources based on a gas puff target are presented in the paper. The sources have been developed for application in processing materials using EUV radiation in the wavelength range from about 5 nm to about 50 nm that is efficiently produced in result of irradiation a double-stream gas puff target with high-intensity laser pulses from a Nd:YAG laser (0.8 J/4 ns/10 Hz). The sources can be equipped with two various grazing incidence optical systems to focus EUV radiation: an axisymmetrical ellipsoidal mirror or a multifoil mirror system of the "lobster eye" type. A new design of the laser plasma EUV source dedicated for micro- and nanoprocessing polymers and modification of polymer surfaces is presented for the first time.

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Henryk Fiedorowicz, Andrzej Bartnik, Roman Jarocki, Jerzy Kostecki, Ladislav Pina, Mirosław Szczurek, and Przemysław Wachulak "Recent advancements in technology of compact laser plasma EUV sources", Proc. SPIE 7584, Laser Applications in Microelectronic and Optoelectronic Manufacturing XV, 75840U (17 February 2010); https://doi.org/10.1117/12.841715

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