CDU linear model based on aerial image principal components

Zhiyong Yang; Anatoly Y. Burov; Liang Li; Fan Wang; Zhaoxiang Chu

doi:10.1117/12.848429

10 March 2010 CDU linear model based on aerial image principal components

Zhiyong Yang, Anatoly Y. Burov, Liang Li, Fan Wang, Zhaoxiang Chu

Proceedings Volume 7640, Optical Microlithography XXIII; 764035 (2010) https://doi.org/10.1117/12.848429
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

In this paper, we present an image quality model and a process window model that is linear or quadratic with respect to common pupil space errors. Similar to other CDU models in its simplicity, our model expands linear representation to comprehensive image quality specs in a large focus-dose grid. With this model we identify corrections to the full Bossung curve or process window shapes that are proportional to aberration levels.

Citation Download Citation

Zhiyong Yang, Anatoly Y. Burov, Liang Li, Fan Wang, and Zhaoxiang Chu "CDU linear model based on aerial image principal components", Proc. SPIE 7640, Optical Microlithography XXIII, 764035 (10 March 2010); https://doi.org/10.1117/12.848429

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