16nm with 193nm immersion lithography and double exposure

Valery Axelrad; Michael C. Smayling

doi:10.1117/12.846677

2 April 2010 16nm with 193nm immersion lithography and double exposure

Valery Axelrad, Michael C. Smayling

Proceedings Volume 7641, Design for Manufacturability through Design-Process Integration IV; 764109 (2010) https://doi.org/10.1117/12.846677
Event: SPIE Advanced Lithography, 2010, San Jose, California, United States

Abstract

Gridded Design Rules (GDR) in combination with lines/ cuts double patterning allow imaging of 16nm designs with 193nm immersion lithography. Highly regular lines/ cut patterns result in the existence of a well-defined optimal set of lithographic conditions. Since cuts are all of identical shape and relatively sparse, good image quality can be obtained with minimal or simplified pattern correction (OPC equivalent) to compensate for proximity effects. The use of local interconnect (LI) is shown to offer further reduction of the required number of cuts and improves pattern uniformity and image quality. Critical cut patterns of poly and M1 layers in selected worst case standard GDR cells were considered. Simultaneous co-optimization of cut geometry as well as lithographic conditions such as scanner entrance pupil illumination was used to bring all cuts within ~1nm of target CDs at best focus. Optimized conditions significantly reduced the sensitivity of printed patterns to proximity effects. Manufacturability was verified using DOF and NILS metrics before and after co-optimization. Experimental lens entrance pupil illumination and lens aberrations including polarization effects were included in the analysis.

Citation Download Citation

Valery Axelrad and Michael C. Smayling "16nm with 193nm immersion lithography and double exposure", Proc. SPIE 7641, Design for Manufacturability through Design-Process Integration IV, 764109 (2 April 2010); https://doi.org/10.1117/12.846677

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available